Nhigh-k gate dielectrics for cmos technology books pdf

As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing. Dielectric materials for microelectronics springerlink. Request pdf on aug 23, 2012, shijie wang and others published high k gate dielectrics for cmos technology find, read and cite all the research you need on researchgate. Main high k gate dielectrics for cmos technology high k gate dielectrics for cmos technology a stateoftheart overview of high k dielectric materials for advanced fieldeffect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over. Scaling trend of gate oxide thickness over the past five technology generations from the 0. Advanced metal gatehighk dielectric stacks for high. Request pdf on aug 23, 2012, fuchien chiu and others published high k gate dielectrics for cmos technology find, read and cite all the research you need on researchgate.

This is primarily because the ewf of a polysihighk dielectric stack is. Electrical characterization of highk dielectric gates for. Afanasev and others published high k gate dielectrics for cmos technology find, read and cite all the research you need on researchgate. Gang he is professor at the school of physics and materials science of the anhui university, china. The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials. Highk gate dielectrics for cmos technology request pdf. A stateoftheart overview of high k dielectric materials for advanced fieldeffect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. In general, dielectric breakdown mechanisms in amorphous films can be categorized as either intrinsic or extrinsic in nature he and sun, high k gate dielectrics for cmos technology, 2012, p. The resulting metal gate high k dielectric stacks have i equivalent oxide thickness eot of 1. Highk gate dielectrics for cmos technology download. He obtained his academic degrees from the institute of solid state physics of the chinese academy of sciences.

High k gate dielectrics for future cmos technology t. In the case of transistors, the gate dielectric is integral to the performance of. High permittivity gate dielectric materials springerlink. Ma yale university, center for microelectronics, and department of electrical engineering new haven, ct 065208284 introduction high k dielectrics are being actively pursued by the semiconductor industry to replace sio2 as the gate dielectric for future generations of cmos transistors. High k gate dielectrics for cmos technology 9783527330324. The continuous miniaturization of complementary metaloxidesemiconductor cmos technologies has led to unacceptable tunneling current leakage levels for. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration. Request pdf highk gate dielectrics for cmos technology a stateoftheart. His research interests and efforts cover the areas of the preparation, characterization, fundamental understanding and associated applications of high k gate dielectric thin films.